Dimension Change during Multi-step Imprint Process and In-plain Compression
نویسندگان
چکیده
منابع مشابه
Step and Flash Imprint Lithography
The goal of the SFIL development program is to enable patterning of sub-100 nm features at room temperature and with minimal applied pressure. We believe the use of low viscosity materials and photopolymerization chemistry will enable SFIL to achieve the throughput required for use in the microelectronics industry. Additionally, the rigid transparent imprint template used in SFIL enables a prec...
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Step and flash imprint lithography (SFIL) is a photolithography process in which the photoresist is dispensed onto the wafer in its liquid monomer form and then imprinted and cured into a desired pattern instead of using traditional optical systems. The mask used in the SFIL process is a template of the desired features that is made using electron beam writing. Several variable sized drops ofmo...
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The goal of the Step and Flash Imprint Lithography (SFIL) development program is to enable patterning of sub-100 nm features in a manner that has dramatic cost savings over conventional projection lithography techniques. The SFIL process is performed at room temperature and with minimal applied pressure, and we believe the use of low viscosity materials and photopolymerization chemistry will en...
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 2020
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.33.199